American startup Substrate promises 2nm-class chipmaking with particle accelerators, at a tenth of the cost of EUV — X-ray lithography system has potential to surpass ASML’s EUV scanners

A U.S. startup is developing a compact particle-accelerator-based X-ray lithography system that could surpass ASML’s EUV scanners in resolution and cut wafer costs tenfold by the end of the decade, but its plan to build its own fabs rather than sell tools means it must reinvent the entire semiconductor production supply chain from the ground up.